2020-03-17
2020-03-09
PAM-XIAMEN provides InGaAsN epitaxially on GaAs or InP wafers as follows:
Layer |
Doping |
Thickness (um) |
Remark |
|||
GaAs |
undoped |
~500 |
<001> wafer substrate |
|
||
InGaAsN* |
undoped |
0.150 |
band gap <1 eV |
|
|
|
Al(0.3)Ga(0.7)As |
undoped |
0.5 |
|
|
|
|
GaAs |
undoped |
2 |
|
|
|
|
Al(0.3)Ga(0.7)As |
undoped |
0.5 |
|
|
|
|
ITEM |
x/y |
Doping |
carrier conc.(cm3) |
Thickness(um) |
wave length(um) |
Lattice mismatch |
InAs(y)P |
0.25 |
none |
5.0*10^16 |
1.0 |
- |
|
In(x)GaAs |
0.63 |
none |
1.0*10^17 |
3.0 |
1.9 |
600<>600 |
InAs(y)P |
0.25 |
S |
1.0*10^18 |
205.0 |
- |
|
InAs(y)P |
0.05->0.25 |
S |
1.0*10^18 |
4.0 |
- |
|
InP |
- |
S |
1.0*10^18 |
0.3 |
- |
|